Nano fabricated silicon nanorod array with titanium nitride coating for on-chip supercapacitors
Lu, Pai; Ohlckers, Per; Müller, Lutz; Leopold, Steffen; Hoffmann, Martin; Grigoras, Kestutis; Ahopelto, Jouni; Prunnila, Mika; Chen, Xuyuan
Journal article, Peer reviewed
Accepted version
Åpne
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http://hdl.handle.net/11250/2563127Utgivelsesdato
2016Metadata
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Sammendrag
We demonstrate high aspect ratio silicon nanorod arrays by cyclic deep reactive ion etching (DRIE) process as a scaffold to enhance the energy density of a Si-based supercapacitor. By unique atomic layer deposition (ALD) technology, a conformal nanolayer of TiN was deposited on the silicon nanorod arrays as the active material. The TiN coated silicon nanorods as a supercapacitor electrode lead to a 6 times improvement in capacitance compared to flat TiN film electrode.