Nano fabricated silicon nanorod array with titanium nitride coating for on-chip supercapacitors
Journal article, Peer reviewed
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OriginalversjonElectrochemistry communications. 2016, 70 51-55. 10.1016/j.elecom.2016.07.002
We demonstrate high aspect ratio silicon nanorod arrays by cyclic deep reactive ion etching (DRIE) process as a scaffold to enhance the energy density of a Si-based supercapacitor. By unique atomic layer deposition (ALD) technology, a conformal nanolayer of TiN was deposited on the silicon nanorod arrays as the active material. The TiN coated silicon nanorods as a supercapacitor electrode lead to a 6 times improvement in capacitance compared to flat TiN film electrode.