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dc.contributor.authorLi, Gang
dc.contributor.authorChang, Zhuoqing
dc.contributor.authorLi, Tingyu
dc.contributor.authorWang, Kaiying
dc.date.accessioned2020-04-15T11:11:23Z
dc.date.available2020-04-15T11:11:23Z
dc.date.created2019-10-10T16:14:35Z
dc.date.issued2019
dc.identifier.citationIonics (Kiel). 2019, 25 (12), 5881-5888.en_US
dc.identifier.issn0947-7047
dc.identifier.urihttps://hdl.handle.net/11250/2651133
dc.description.abstractIn this paper, we report in situ growth of hexagonal prism-like Ni(OH)2 microrods via one-step hydrothermal process, where nickel foam is directly oxidized in a high concentration hydrogen peroxide (H2O2) solution without additional nickel sources, surfactant, or post-treatment. The nickel foam not only serves as a nickel source but also as 3D scaffold for Ni(OH)2 growth to form binder-free electrodes. The in situ growth can ensure close contact between conductive Ni foam substrate and as-formed Ni(OH)2 microrods, providing efficient electron collection paths and electrochemical stability. Mass loading of Ni(OH)2 on nickel foam could be tailored by adjusting the concentration H2O2. Possible growth mechanism of hexagonal prism-like Ni(OH)2 microrods is discussed to understand the morphologies under various H2O2 concentrations. When works as a binder-free electrode, the Ni(OH)2-coated nickel foam exhibits a remarkable areal capacitance ~ 1.598 C cm−2 (560 C g−1) at a current density of 1 mA cm−2, relatively high rate capability with 57.14% areal capacitance retained at 10 mA cm−2, as well as better cycling stability with 72.9% areal capacitance remained after 3000 charge-discharge cycles. Such superior performance demonstrates that Ni(OH)2 microrods in situ grown on metallic nickel foam substrate might be a potential electrode material for electrochemical capacitors.en_US
dc.language.isoengen_US
dc.titleIn situ growth of hexagonal prism-like Ni(OH)2 microrods on nickel foam as binder-free electrodesen_US
dc.typePeer revieweden_US
dc.typeJournal articleen_US
dc.description.versionacceptedVersionen_US
dc.source.pagenumber5881-5888en_US
dc.source.volume25en_US
dc.source.journalIonics (Kiel)en_US
dc.source.issue12en_US
dc.identifier.doi10.1007/s11581-019-03171-6
dc.identifier.cristin1736150
cristin.ispublishedtrue
cristin.fulltextoriginal
cristin.qualitycode1


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